The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2003

Filed:

Jun. 25, 2002
Applicant:
Inventors:

Hong-Sick Park, Yongin, KR;

Jin-Ho Ju, Seoul, KR;

Yu-Kyung Lee, Yongin, KR;

Sung-Chul Kang, Seongnam, KR;

Sae-Tae Oh, Anseong, KR;

Doek-Man Kang, Anseong, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 ; G03F 7/40 ; G03F 7/16 ; G03F 7/38 ;
U.S. Cl.
CPC ...
G03F 7/42 ; G03F 7/40 ; G03F 7/16 ; G03F 7/38 ;
Abstract

A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.


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