The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Jul. 27, 2001
Peter James Andrews, Wantage, GB;
Stephen Ivor Hall, Oxford, GB;
Michael Inman, Abingdon, GB;
James Timothy Shawcross, Charlbury, GB;
David Michael Weeks, Abingdon, GB;
Christopher David John Manson-Whitton, Abingdon, GB;
Accentus plc, Didcot, GB;
Abstract
A reactor for the plasma-assisted processing of gaseous media comprising a reactor chamber including a gas permeable bed of active material, a power source for applying across the bed of active material a potential sufficient to establish a plasma in a gaseous medium flowing through the bed of active material and a chamber having an inlet stub and an outlet stub for constraining the gaseous medium to flow through the bed of active material, wherein the bed of active material comprises a matrix of beads of a dielectric material having an assembly of regular arrays of beads in each of which adjacent beads are connected to a high voltage input terminal or an electrical ground.