The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Nov. 26, 2001
Helfried Weinzerl, Feldkirch, AT;
Dubs Martin, Maienfeld, CH;
Unaxis Balzers Aktiengesellschaft, Balzers, LI;
Abstract
A sputtering target made of Ag Ma Mb or Cu Ma Mb , where x>50 at % and Ag or Cu are a first metal, Ma is a second metal and Mb is a third metal is used in a method for manufacturing data storage disks. The method of manufacture includes providing a substrate, providing a spacer layer of a material transmitting light of a selected wavelength onto a surface of the substrate, applying a first layer of a first metal alloy between the substrate and spacer layer, providing a second layer of a second metal alloy on the spacer layer, and depositing the first and second metal alloys so that one of the first and second layers is semi-transparent with respect to the light. The first and second alloys have at least one common metal provided in particular fractions of the alloys.