The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2003

Filed:

Jan. 08, 2002
Applicant:
Inventors:

Ann Margaret Irvin, Richmond, GB;

Paul Meredith, Brisbane, AU;

David Roy Sandbach, Overijse, BE;

Jean Wevers, Steenhuffel, BE;

Assignee:

The Procter & Gamble Company, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B43M 1/00 ; B43M 1/700 ;
U.S. Cl.
CPC ...
B43M 1/00 ; B43M 1/700 ;
Abstract

An applicator for a fabric treatment to effect mechanical stain removal has a no rinse fabric treatment composition and an application device. The application device induces a certain frictional stress upon the fabric and has a frictional stress value on the fabric optimally chosen to effect fabric treatment and is at the same time kind to the fabric. Advantageously, the application device has a frictional stress value of from 0.05 N mm to 1 N mm . The frictional stress should be high enough to ensure good mechanical stain removal, good delivery of the fabric treatment composition into the fabric and allow fabric treatment with fabric friendly chemical compositions at low levels.


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