The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2003

Filed:

Feb. 05, 2001
Applicant:
Inventor:

Kouichi Kumagai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

A designing method of a semiconductor integrated circuit is composed of providing a library storing a macro mask pattern for a macro circuit including buffer circuits, selecting one of the buffer circuits as a selected buffer circuit and arranging the macro mask pattern and a third wiring pattern to produce an integrated circuit mask. Each of buffer circuits is composed of first and second wirings apart from each other, a firs semiconductor element selectively supplying the first wiring with a power supply potential in accordance with the output signal and a second semiconductor element selectively supplying the second wiring with a grounded potential in accordance with the output signal. The macro mask pattern includes buffer mask patterns, each of which corresponds to one of the buffer circuits. Each of the buffer mask patterns is composed of a first wiring pattern for the first wiring, and a second wiring pattern for the second wiring. In the integrated circuit mask pattern, the first and second wiring patterns of the selected buffer circuit are connected with each other by the third wiring pattern.


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