The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2003

Filed:

Dec. 13, 2001
Applicant:
Inventors:

Jean-François Couillard, Sunnyvale, CA (US);

François Trépanier, St-Augustin-de-Desmaures, CA;

Chiara Meneghini, Sainte-Foy, CA;

Jocelyn Lauzon, Saint-Augustin-de-Desmaures, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 ;
U.S. Cl.
CPC ...
G02B 5/18 ;
Abstract

A tunable phase mask assembly for use in photoinducing an optical wavelength filter in an optical waveguide. The phase mask assembly includes a phase mask having a length extending between two opposite longitudinal ends. The phase mask has grating corrugations projecting from its surface and distributed with a periodicity along its length. The periodicity of the phase mask is tuned by reversibly changing its length between the two longitudinal ends, such as by compressing or stretching the mask. In this manner, the interference pattern of a light beam passing through the phase mask is also tuned, which allows to control the characteristics of a wavelength filter photoinduced using this phase mask assembly.


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