The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
May. 04, 2000
Lincoln David Stone, Ryde, AU;
Oliver Bock, London, GB;
Canon Information Systems Research Australia Pty Ltd., North Ryde, AU;
Abstract
The artwork is defined by a tree structure having leaf nodes comprising objects and parent nodes comprising graphical operators. Each node has fields storing values indicative of horizontal and vertical alteration rules applicable to that node or its sub-tree. The method comprises a selection step, a traversal step and two application steps. In the selection step ( ) a target area is selected for fitting the artwork. In the traversal step, the method traverses the nodes of the tree structure ( ) traversing one or more of the said nodes. In the first application step, the method applies, for each one of the traversed nodes that is a leaf node, a horizontal alteration rule ( ). The horizontal rule re-positions each point within the object comprising the leaf node to another point within a target area, whereby altering the shape of the artwork in a horizontal direction. In the second application step, the method applies a vertical alteration rule ( ) in a similar manner as the first application step, whereby altering the shape of the artwork in a vertical direction.