The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2003

Filed:

Mar. 28, 2000
Applicant:
Inventors:

James P Spallas, Dublin, CA (US);

Stuart L Friedman, Palo Alto, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 4/300 ;
U.S. Cl.
CPC ...
H01J 4/300 ;
Abstract

An electron multiplier having an access for allowing a beam to pass is presented. The electron multiplier collects particles traveling back along the beam and is capable of collecting the particles arbitrarily close to the beam. The electron multiplier includes at least two plates having secondary electron emitting surfaces, the at least two plates being separated by a small distance. The electron multiplier has a beam access through the at least two plates. Particles enter the electron multiplier in a direction opposite that of propagation of the beam and impact a secondary electron emitting surface, thereby being captured between the top plate and the bottom plate. In some embodiments of the invention, the electron multiplier is segmented so that azimuthal distributions of the particles can be determined. In some embodiments, the electron multiplier includes a stack of electron emitting surfaces arranged so that an angular distribution of the particles can be determined.


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