The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Sep. 12, 2000
Haruyuki Fukuzawa, Fuji, JP;
Toshio Shiwaku, Fuji, JP;
Polyplastics Co., Ltd., Osaka, JP;
Abstract
A batch type apparatus for producing a liquid crystalline polymer includes a reactor, a first gas-pressurizing unit, a die-head, a shut-off valve, and a die-plate. The reactor produces a liquid crystalline polymer capable of forming an anisotropic melt phase. The reactor has a discharge port at a lower portion thereof. The first gas-pressurizing unit is attached to the reactor for discharging under pressure the liquid crystalline polymer by use of an inert gas. The die-head includes, at one end portion thereof, a discharge valve which opens and closes the discharge port; at a middle portion thereof, an internal chamber which communicates with the discharge port and is heated and regulated from the peripheral surface thereof; and at the other end portion thereof, an opening which forms an end portion of the internal chamber. The shut-off valve is connected to the other end portion of the die-head and capable of opening and closing the opening. The die-plate is disposed at the opening of the shut-off valve.