The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2003

Filed:

Mar. 22, 2002
Applicant:
Inventor:

Maki Uchida, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 5/14 ;
U.S. Cl.
CPC ...
G03G 5/14 ;
Abstract

The invention relates to an electrophotosensitive material comprising an intermediate layer formed between a conductive substrate and a photosensitive layer, and featuring heat treatment conditions for forming the intermediate layer defined such that a ratio A /A between absorbances at two measurement wavelengths determined from a visible absorption spectrum of the intermediate layer is not more than a value of an intersection of a first approximation line and a second approximation line given by a correlation distribution between the absorbance ratio and the residual potential of the photosensitive material, the first approximation line representing little change of the residual potential despite the increase of the ratio A /A , the second approximation line representing a proportional increase of the residual potential with increase of the ratio A /A . The invention provides the electrophotosensitive material free from the variations of residual potential.


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