The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Jun. 28, 2002
Applicant:
Inventors:
Bryan P. Staker, Pleasanton, CA (US);
James P. Spallas, Dublin, CA (US);
Lawrence P. Muray, Moraga, CA (US);
Andres Fernandez, Dublin, CA (US);
Assignee:
Glimmerglass Networks, Inc., Hayward, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/182 ;
U.S. Cl.
CPC ...
G02B 7/182 ;
Abstract
A MEMS device having a fixed element and a movable element wherein one or the other of the fixed element and the movable element has at least one radially-extended stop or overdeflection limiter. A fixed overlayer plate forms an aperture. The aperture is sized to minimize vignetting and may be beveled on the margin. Overdeflection limitation occurs during deflection before the movable element can impinge on an underlying electrode. The overdeflection limiter may be conveniently placed adjacent a gimbaled hinge.