The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Nov. 26, 2001
Applicant:
Inventors:
Theodore M. Bloomstein, Brookline, MA (US);
Michael Switkes, Somerville, MA (US);
Mordechai Rothschild, Newton, MA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 ; G03B 2/114 ;
U.S. Cl.
CPC ...
G01B 9/02 ; G03B 2/114 ;
Abstract
An interference projection system for use with lithography using quasi-coherent sources, which has a non-diffractive beam splitting module and a non-diffractive module to cause interference of two or more beams, the modules combining to form interfering beams having the same orientation on a target surface. Two etalons are used to split a beam, to form two beams of the same orientation, strength and polarization. One or more pairs of mirrors cause the beam to interfere.