The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Sep. 24, 1999
Daniel H. Illowsky, Cupertino, CA (US);
Dan S. Bloomberg, Palo Alto, CA (US);
Robert E. Weltman, Los Altos, CA (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A system for printing glyph frames around known obstructions. All frames in an area are determined to be obstructed or unobstructed, based on their location with respect to other printed areas. The unobstructed locations can be numbered and glyph data printed within. In the alternative, the good locations can be numbered modulo some number much smaller that the number of available locations to provide redundancy. The unobstructed locations can be stored in either the sync lines or in the data area of other locations known to be unobstructed. Also, the frame itself can be identified as obstructed or unobstructed to provide more redundancy.