The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2003
Filed:
Aug. 09, 2002
Koji Shinobudani, Hiroshima, JP;
Tetsuo Shinomiya, Hiroshima, JP;
Mitsuo Nagai, Hiroshima, JP;
Nobuhiro Haramoto, Hiroshima, JP;
Hiroshi Miyahara, Hiroshima, JP;
Toshiyuki Ninomiya, Hiroshima, JP;
Yasuharu Nosho, Hyogo, JP;
Shinichi Hashimoto, Hyogo, JP;
Masakazu Kato, Hyogo, JP;
Kazuhiro Ueshima, Hyogo, JP;
Other;
Abstract
A device and a method for continuous high-pressure treatment; the method, comprising the steps of increasing the pressure of raw materials ( ) in a feed tank ( ) by a pressurizing pump ( ) so as to continuously feed the raw material to treatment containers ( ) and ( ) and increasing the flow rate of the pressurizing pump ( ) over that of a depressurizing pump ( ) or continuously exhausting the raw material from the treatment containers ( ) and ( ) through a pressure regulating flow path resistance ( ) while depressurizing; the device, comprising pressure releasing bypass circuits ( ) disposed in the flow path resistance ( ) in parallel with each other, wherein the insides of the treatment containers ( ) and ( ) are kept in a specified high-pressure state during the continuous processing.