The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Apr. 03, 2002
Sterling Eduard McBride, Princeton, NJ (US);
Peter J. Zanzucchi, Princeton Junction, NJ (US);
Joseph Hy Abeles, East Brunswick, NJ (US);
Sarnoff Corporation, Princeton, NJ (US);
Abstract
A method and apparatus for configuring and tuning a crystal by selectively controlling a fluid supplied to a plurality of nodes within a substrate. The apparatus comprises a substrate having at least one node that can be selectively supplied with a liquid that will change the material property of the node. The node may be a spherical cavity in a three-dimensional structure, a cylindrical aperture in two-dimensional structure, or a cavity in a one-dimensional structure. The node or nodes in the substrate are coupled to a fluid distribution assembly that selectively alters the material property of the nodes. The material property may be changed by moving the fluid or material in a fluid, using electrohydrodynamic pumping, electroosmotic pumping, electrophoresis, thermocapillarity, electrowetting or electrocapillarity. The change in the material property in at least one of the nodes changes the electromagnetic radiation filtering or switching characteristics of the crystal.