The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Mar. 28, 2001
Konstantin Sokolov, Austin, TX (US);
Rebekah Drezek, Houston, TX (US);
Urs Utzinger, Austin, TX (US);
Rebecca Richards-Kortum, Austin, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
Methods and apparatus for assessing the size of a scattering element of a sample. Primary radiation is generated from a source. The primary radiation is polarized to produce polarized primary radiation. The polarized primary radiation is directed to the sample to generate reflected radiation. The reflected radiation is directed through a polarizer to produce filtered reflected radiation, the polarizer being configured to select reflected radiation parallel and perpendicular to the polarization of the polarized primary radiation. The filtered radiation is detected, and a depolarization ratio is calculated using the detected filtered radiation. The size of the scattering element is calculated using the depolarization ratio.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile