The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Nov. 22, 2002
Koji Tange, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A first region of an object ( ) to be written corresponding to a shot region (H ) is irradiated with an electron beam ( ) for a standard shot period (T ). A pattern (M ) is thereby written in the first region of the object ( ) to be written. Next, a second region of the object ( ) to be written corresponding to a shot region (H ) is irradiated with the electron beam ( ) for a shot period (T ) which is determined according to the shot size of the second region. A pattern (M ) is thereby written in the second region of the object ( ) to be written. Owing to the correction of shot period, the finished dimension of the pattern M is the same as the designed dimension thereof with respect to the Y direction.