The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Jan. 18, 2002
Shinichi Kojima, Wappingers Falls, NY (US);
Nikon Corporation, Tokyo, JP;
Abstract
A method and apparatus for aligning a charged particle beam with an aperture includes providing a hollow beam aperture device adapted for shaping a charged particle beam into a hollow charged particle beam. Then direct the charged particle beam through the aperture. Provide deflection coils for deflecting the charged particle beam relative to the aperture. Vary the current to the alignment deflection coils while measuring the aperture electrical current generated by charged particles reaching the hollow beam aperture as a function of the current to the alignment deflection coils. Then adjust the current in the alignment deflection coils based on the aperture electrical current to center the charged particle beam on the hollow beam aperture. Preferably, separate hollow beam and peripheral beam apertures with associated sensing and current are used to center the beam on respective ones of the apertures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile