The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
May. 31, 2002
Wen-Yen Hwang, Sugar Land, TX (US);
Klaus Alexander Anselm, Sugar Land, TX (US);
Jun Zheng, Houston, TX (US);
Applied Optoelectronics, Inc., Sugar Land, TX (US);
Abstract
A method for fabricating a laser for generating single-longitudinal mode laser light at a lasing wavelength. A semiconductor active region for amplifying, by stimulated emission, light in the laser cavity at the lasing wavelength is formed. A grating is formed adjacent to the active region, the grating having a grating period corresponding to a Bragg wavelength substantially equal to the lasing wavelength. An intermediate section of the grating is removed to result in first and second pluralities of gratings separated by a gratingless intermediate section. First and second grating sections are formed comprising the first and second pluralities of gratings, where the first and second grating sections each have a first effective index of refraction. A gratingless phase-shift section is formed in said intermediate section, the phase-shift section being disposed adjacent to the active region and between the first and second grating sections and having a second index of refraction different than the first index of refraction. The phase-shift section has a length sufficient to impart a phase shift for light at the lasing wavelength sufficient to achieve single-longitudinal mode operation. Alternatively, a grating material layer is deposited adjacent to the active region, the grating material layer having a first section, a second section, and an intermediate section between the first and second sections. Gratings are formed in the first and second sections to form a first grating section in the first section, a second grating section in the second section, leaving a gratingless phase-shift section in the intermediate section.