The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2003

Filed:

Jul. 18, 2002
Applicant:
Inventor:

Didier J. Martin, Givry, FR;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 7/44 ;
U.S. Cl.
CPC ...
G03C 7/44 ;
Abstract

The invention relates to a method for processing an exposed color reversal photographic film. This method comprises the step of circulating the exposed film in a fixing bath, in and then a final washing zone comprises at least one washing bath. Each washing bath of this zone comprising a buffer prepared from a weak acid and its conjugated base, with a conjugated base concentration more than 1 g/l, said buffer being chosen to maintain the pH between 4.5 and 6. The method comprises then the step of collecting the contents of the washing baths of this zone and the passage of said contents through a nanofiltration device comprising a membrane, whose cut-off threshold is more than the molar mass of the weak acid and the conjugated base making up the buffer, to give a permeate that is recycled in the final washing zone.


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