The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Feb. 05, 2001
Abstract
The invention provides a method for fabricating diffusive-type light reflector which is a substrate having a plurality of bumpy elements with reflective curved surfaces. Each of the plurality of bumpy elements has a first surface and a second surface, the first angle (&agr; or &thgr;) between the first surface and the substrate is different from the second angle (&bgr; or &phgr;) between the second surface and the substrate. A slit-width-adjusting mask is proposed for manufacturing the curved reflective elements in one exposing step according to the present invention. The slit-width-adjusting mask includes a plurality of slit areas. The first transparent slit area under defocus exposure has the first exposure p , and the second transparent slit area has the second exposure q . Each transparent slit area has the same area and is of the width p , the first transparent slit area is of the width p , and the second transparent slit area has the width q . The first exposure p is greater than the second exposure q , and (q )/(p )=(q /(p ). The invention can also be used in a diffusive-type light reflector TFT-LCD, as the reflector element between the liquid crystal layer and the active matrix.