Exposure mask and exposure method using the same

Abstract

An exposure mask for exposing a photosensitive resist layer formed on the surface of a substrate having an element so that the resist layer remains in the shape of an ABS pattern includes a mark provided within a light transmission section for exposure. The mark determines a relative position between the substrate and the light transmission section on the basis of the element. An exposure method using the exposure mask includes the steps of: determining a relative position between the substrate and the light transmission section on the basis of the element by the mark provided within the light transmission section of the exposure mask; exposing the photosensitive resist layer on the surface of the substrate through the light transmission section of the exposure mask; and developing the exposed photosensitive resist layer so that the resist layer is left in the shape of the ABS pattern.