The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
May. 14, 2001
Philip E. Buchsbaum, Oldsmar, FL (US);
Michael J. Morris, Dunedin, FL (US);
Ocean Optics, Inc., Dunedin, FL (US);
Abstract
A monolithic patterned dichroic filter array is mounted on a wafer by combining microelectronic and microlithography techniques. A wafer is coated with a photoresist. The assembly is masked, and the unmasked photoresist, after exposure to ultraviolet light, is developed to expose a predetermined section. That section of wafer is then over developed to create an undercut in its walls and to expose the underlying wafer. Dichroic filter material is then deposited onto the wafer by a cold process, and the photoresist layer is then removed, leaving only the dichroic filter material on the wafer. The process is repeated to create an array. The finished wafer is then bonded to a linear or two dimensional detector array, or to a glass window that is then bonded to a linear or two dimensional detector, to create a high performance spectral detector for spectroscopic imaging. When placed on a two dimensional detector in a camera, an imaging system capable of showing spatial variation in color, chemicals or other spectrally dependent parameters is produced.