The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2003
Filed:
Dec. 19, 2000
David Emil Nelson, Independence Township, MI (US);
Bob Xiaobin Li, Grand Blanc, MI (US);
Blaine Roy Danley, Linden, MI (US);
Delphi Technologies, Inc., Troy, MI (US);
Abstract
Single dielectric barrier extruded element non-thermal plasma reactors include first and second opposing dielectric barrier layers forming an exhaust channel therebetween, the first barrier layer provided with a first polarity conductor on an interior surface thereof and the second barrier layer provided with a second polarity conductor on the exhaust channel exterior surface. The second barrier layer provides the single dielectric barrier layer. The second polarity conductor serves as a conductor on the channel interior surface of the adjacent exhaust channel in repetitive fashion. The reactors are free of dedicated conductive passages. An electrode coating pattern having conductive coating extending fully to the side walls to connect with side bus connections eliminates the need for internal bus paths. Single dielectric barrier planar and swept-shaped reactor elements have minimal or partially extending internal support ligaments providing enhanced conversion efficiency.