The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2003

Filed:

Sep. 24, 2001
Applicant:
Inventors:

Da Yu Wang, Troy, MI (US);

David K. Chen, Rochester Hills, MI (US);

Kaius K. Polikarpus, Grand Blanc, MI (US);

Walter T. Symons, Grand Blanc, MI (US);

Assignee:

Delphi Technologies, Inc., Troy, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/7407 ;
U.S. Cl.
CPC ...
G01N 2/7407 ;
Abstract

A hydrogen sensor and process for measuring hydrogen gas concentrations includes a pump cell and a measuring cell. The pump cell includes a first conducting electrolyte layer having a top and a bottom surface, and an electrode disposed on the top and bottom surfaces, wherein the top electrode is in communication with an unknown concentration of hydrogen gas. The measuring cell includes a second conducting electrolyte layer having a top and a bottom surface, and an electrode disposed on the top and bottom surfaces, wherein the bottom electrode is in communication with a reference gas source. A diffusion-limiting barrier is disposed between the pump cell bottom electrode and the measuring cell top electrode, wherein hydrogen diffusion through the diffusion-limiting barrier is controlled by a Knudsen diffusion mechanism at hydrogen concentrations greater than about 40%.


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