The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Oct. 03, 2001
Koji Kakizaki, Gotenba, JP;
Yoichi Sasaki, Gotenba, JP;
Ushio Denki Kabushiki Kaisya, Tokyo, JP;
Abstract
The present invention relates to an ArF excimer laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 4 kHz and also relates to a KrF excimer laser apparatus and fluorine laser apparatus for lithography capable of stretching the laser pulse width even when the repetition rate exceeds 2 kHz. In a laser apparatus for lithography having laser discharge electrodes disposed in a laser chamber and a peaking capacitor connected in parallel to the laser discharge electrodes, the period Tn of the waveform of an oscillating current flowing in a first circuit loop formed by the final-stage capacitor of a magnetic pulse compression circuit and the laser discharge electrode and the period Tp of the waveform of an oscillating current flowing in a second circuit loop formed by the peaking capacitor and the laser discharge electrodes satisfy the condition of 5Tp≦Tn, and the period Tn satisfies the condition of Tn<250 ns, whereby a laser oscillating operation is performed by at least 2.5 cycles of the oscillating current flowing between the laser discharge electrodes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile