The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Mar. 30, 2001
Applicant:
Inventor:
Takahisa Shiozawa, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/742 ;
Abstract
An illumination system for lithography includes an optical system for projecting light from a laser onto a mask. The optical system includes a birefringent element being effective to dissolve polarization of light from the laser. The birefringent element is made of CaF .
Quick Actions:
Shiozawa, Takahisa. (2003). Exposure apparatus and device manufacturing method (U.S. Patent No. 6636295). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6636295
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