The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2003

Filed:

Jul. 22, 1999
Applicant:
Inventor:

Chris Gross, Yorktown, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/720 ;
U.S. Cl.
CPC ...
H01L 2/720 ;
Abstract

A semiconductor strain gage having an electrically resistive substrate layer and a layer of electrically conductive silicon supported by the substrate layer. The silicon layer can be an epitaxial silicon layer grown on a surface of the substrate layer or a diffused or ion-implanted layer formed in the surface of the substrate layer. Also, a force measuring and detecting device including a force responsive member and the above-described semiconductor strain gage attached to the force responsive member, the strain gage measuring forces applied to the force responsive member.


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Gross, Chris. (2003). Silicon strain gage having a thin layer of highly conductive silicon (U.S. Patent No. 6635910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6635910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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