The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2003

Filed:

Apr. 26, 2001
Applicant:
Inventors:

Arunkumar Subramanian, Minneapolis, MN (US);

Susan Bromley, Bloomington, MN (US);

Bradley J. Nelson, North Oaks, MN (US);

Karl Vollmers, Crystal, MN (US);

Assignee:

ADC Telecommunications, Inc., Eden Prairie, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 7/00 ; H01H 5/900 ; H01H 9/00 ;
U.S. Cl.
CPC ...
B81B 7/00 ; H01H 5/900 ; H01H 9/00 ;
Abstract

A microelectromechanical relay and a method of fabricating the same that combines electrostatic actuation with electromagnetic actuation. The relay has very low contact resistance when the relay is in its ON state and enhanced contact-to-contact isolation when the relay is in its OFF state. The relay includes a substrate having a trench formed therein, a first pair of contacts located in the trench and an actuator for controllably establishing electrical contact between the first pair of contacts. The actuator includes spaced apart supports on the substrate and a movable beam extending between the supports. A contact cross bar is located on the movable beam facing the first pair of contacts. A first electrode is located on the movable beam and a second electrode is located on the substrate. Electromagnetic force is used to deflect the movable beam towards the substrate and then electrostatic force is used to bring the contact cross bar in physical contact with the first pair of contacts.


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