The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Jun. 12, 2001
Applicant:
Inventors:
Jeffrey W. Sleight, Ridgefield, CT (US);
John J. Ellis-Monaghan, Grand Isle, VT (US);
Suk Hoon Ku, Beacon, NY (US);
Patrick R. Varekamp, Croton on Hudson, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1331 ; H01L 2/18222 ;
U.S. Cl.
CPC ...
H01L 2/1331 ; H01L 2/18222 ;
Abstract
A non-critical block mask exposes one of the source and drain in an SOI FET, which is implanted with a leakage implant that increases the leakage in the exposed element, thus providing a conductive path to draw away holes from the transistor body.