The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
May. 07, 2001
Ernest C. W. Lee, Palo Alto, CA (US);
Robert Nagle, Mountain View, CA (US);
Richard J. McReynolds, San Jose, CA (US);
David Chazan, Palo Alto, CA (US);
Robert S. Dubrow, San Carlos, CA (US);
Caliper Technologies Corp., Mountain View, CA (US);
Abstract
A test device for use as a fluorescent standard in microfluidic analytical detection systems includes one or more slits that correspond to, and are of similar dimension to, one or more microchannels in a detection region on a corresponding analysis chip. A fluorescent material is attached to the test device on the side opposite the illumination source such that excitation radiation passes through the slit(s), which defines the focal plane of the illumination optics, and impinges on the fluorescent material thereby causing the fluorescent material to fluoresce. By displacing the fluorescent material relative to the focal plane, the intensity of the radiation exciting the fluorescent material is dispersed relative to the intensity of the radiation at the focal plane, and concomitantly the strength of the resulting fluorescent signal is reduced. An optional spacer is provided to increase the distance of the fluorescent material from the focal plane so as to increase the dispersion of the radiation (decrease the intensity impinging on the fluorescent material). The strength of the resulting fluorescent signal from the fluorescent material can be controlled by selecting a spacer with the appropriate depth.