The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Jul. 10, 2001
Applicant:
Inventor:
Martin A. Afromowitz, Mercer Island, WA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; G03F 7/36 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/00 ; G03F 7/36 ; G03F 7/40 ;
Abstract
A method utilizing gray-tone exposure of a class of thick negative photo-sensitized epoxy resists from the substrate side of a transparent substrate and development methods that rely upon a physical distinction between polymerized (solid) and unpolymerized (liquid) photoresist at elevated temperatures may be used to fabricate 3-D structures in the photo-sensitized epoxy. Such structures may exhibit smoothly-varying topographic features with thicknesses as great as 2 mm.
Quick Actions:
Afromowitz, Martin. (2003). Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists (U.S. Patent No. 6635412). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6635412
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile