The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2003

Filed:

Sep. 22, 2000
Applicant:
Inventors:

David Seniuk, Aylmer, CA;

Marcel Boudreau, Ottawa, CA;

Maxime Poirier, Hull, CA;

Assignee:

Bookham Technology, PLC, Abingdon, GB;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/04 ; G06K 9/74 ; G09B 9/08 ;
U.S. Cl.
CPC ...
G03C 5/04 ; G06K 9/74 ; G09B 9/08 ;
Abstract

Disclosed is a print quality test structure for devices manufactured by lithography. The test structure allows for visual inspection of the print quality of the device. The test structure decouples the effects of overexposure, underexposure and focus so that corrections can be made for future device manufacturing. By visually inspecting each device during lithography, devices of poor quality can be reworked, and costly testing on all devices can be avoided through device screening.


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