The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Sep. 24, 2001
Akihiro Miyauchi, Hitachi, JP;
Lee Chahn, Hitachinaka, JP;
Mitsuru Hasegawa, Hitachi, JP;
Mitsuo Hayashibara, Hitachinaka, JP;
Hiroshi Sasaki, Mito, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The invention relates to a lithographic apparatus for transferring a fine pattern having a line width less than 10 &mgr;m, a lithographic method, a structure for and a method of manufacturing an original master for transfer. The lithographic apparatus comprising an original master on which a pattern is formed within a two-dimensional plane, a slit for filling a medium in the pattern, a medium sump for feeding the medium, a pressure regulating mechanism for adjusting the pressure of the medium filled in the slit, and a lithographic substrate. With this apparatus, the pattern can be batch-transferred, thereby making it possible to easily manufacture electronic parts.