The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2003

Filed:

Mar. 12, 2002
Applicant:
Inventors:

Jyh-Chung Wen, Hsinchu, TW;

Ming-Shyong Lai, Hsinchu, TW;

Bean-Jon Li, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 3/12 ; B22F 7/04 ;
U.S. Cl.
CPC ...
B22F 3/12 ; B22F 7/04 ;
Abstract

A method of regenerating a phase-change sputtering target for optical storage media. First, a used powder-metallurgy sputtering target composed of a target material, an adhesion material, and a backing plate is recycled. Then, the target material is separated from the backing plate. Then, the target adhesion material is scraped from the recycled target material Thereafter, the surface of the recycled target material is processed. Finally, the backing plate, a new adhesion material, the recycled target material, and new powders are placed in a vacuum thermal-pressure furnace in sequence to perform a thermal-pressure sintering process. This completes a new phase-change sputtering target


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