The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Jan. 17, 2001
Harbans S. Sachdev, Hopewell Junction, NY (US);
Richard A. Cormack, Hopewell Junction, NY (US);
Gerard V. Capogna, Hyde Park, NY (US);
Felice J. Mancaruso, Hopwell Junction, NY (US);
Krishna Sachdev, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
This invention relates to water-based alkaline cleaning solutions and their use as an environmentally safer replacement of organic solvents to remove photoresist, polyimide residue and other interlevel dielectric polymer coating residue from polymer film apply equipment, specifically, spin coater bowl and assembly parts consisting of a teflon top shield, stainless steel plate, and a bottom teflon spin coating bowl used in semiconductor device fabrication processes.