The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2003
Filed:
Sep. 21, 2000
Applicant:
Inventors:
Claire Ching-Shan Jung, Plano, TX (US);
Neal T. Murphy, Richardson, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ; B08B 3/12 ;
U.S. Cl.
CPC ...
B08B 3/02 ; B08B 3/12 ;
Abstract
A method for resist strip and particle removal. Wafers ( ) with a patterned resist formed thereon are placed on a wafer chuck ( ) in a scrubber tool ( ). Ozonated deionized water ( ) is applied to the surface of wafer ( ). The ozonated deionized water ( ) strips the resist and removes the resist residue without the use of hazardous chemicals. Particle removal is accomplished in the same tool ( ). The ozonated deionized water ( ) is formed in a closed canister ( ). Deionized water is circulated through the canister ( ) and ozone is added to the deionized water at a premixer ( ).