The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2003
Filed:
Mar. 23, 2001
Applicant:
Inventor:
Michael Jolley, Beaverton, OR (US);
Assignee:
Semitool, Inc., Kalispell, MT (US);
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/04 ; B08B 3/00 ; B08B 5/00 ;
U.S. Cl.
CPC ...
B08B 7/04 ; B08B 3/00 ; B08B 5/00 ;
Abstract
In a method for cleaning a copper surface of a semiconductor wafer or article, nitrogen gas is bubbled or dissolved into a strong alkaline solution, displacing dissolved oxygen from the solution. A nitrogen gas environment is provided over the copper surface. The alkaline solution is then applied to the copper surface. The copper etch rate is greatly reduced. The method is useful in removing residual polishing slurry after a chemical-mechanical polishing step, and for removing residues left in via holes after plasma etching.