The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2003
Filed:
Oct. 26, 2001
Warren G. Siemers, Fort Collins, CO (US);
Gary D. Hamor, Mead, CO (US);
Stratotech Corporation, Loveland, CO (US);
Abstract
Enclosures having adjustable clean gas flow environments and methods of enclosed pressure differential distribution technology. Specifically, clean gas flow enclosures, which provide for the isolation of materials from airborne micro-particulate contamination. An embodiment of the invention utilizes a small footprint, modular, selectable, clean-gas flow environment for handling and isolating materials. The environment can be a clean room class environment by providing filtered gas from a gas flow generator ( ) through a gas filter ( ) to a filtered gas flow space ( ). An embodiment of the invention provides a first plenum ( ) and a second plenum ( ) so that both a horizontal filtered gas flow and vertical filtered gas flow may be used separately or in combination within the same filtered gas flow space ( ).