The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2003
Filed:
Jun. 13, 2002
Applicant:
Inventor:
Tomoharu Hase, Tochigi-ken, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/754 ;
Abstract
An exposure apparatus includes an illumination optical system for illuminating an original with an F excimer laser, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, a gas purging device for replacing a gas in an inside space, which accommodates optical components of at least one of the illumination optical system and the projection optical system, with a dry gas, a hygrometer, disposed in the inside space, for measuring conditions in the inside space and for producing an output, and a controller for controlling the gas purging device on the basis of the output of the hygrometer.