The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2003
Filed:
Dec. 26, 2001
Takeshi Nakayama, Fukaya, JP;
Shinichiro Nakagawa, Fukaya, JP;
Takashi Murai, Fukaya, JP;
Masatsugu Inoue, Kumagaya, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A shadow mask includes a substantially rectangular effective region formed having a number of electron beam passage apertures and opposed to a phosphor screen and a substantially rectangular skirt portion provided around the effective region and extending in the direction of a tube axis. The skirt portion has a pair of long sides extending substantially parallel to a major axis and a pair of short sides extending substantially parallel to a minor axis, the long and short sides being welded to the inner surface of a substantially rectangular mask frame. A distance a from an extending end of the skirt portion on each long side to the weld spot is longer than a distance b from an extending end of the skirt portion on each short side to the weld spot.