The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2003
Filed:
Nov. 30, 2000
Harry J Finn, Lytham, GB;
BAE Systems plc, London, GB;
Abstract
Method and apparatus for determining the location at which radiation is incident on the sensor system which includes an EMI screening mesh by comparing the actual image detected, which includes the higher order diffraction effects, with a search or sample image applied sequentially at different locations and determing the location of the sample image which gives the closest match. The sample image corresponds to an expected pattern or image from a point source incident at a particular location on a particular window/sensor system, and may be generated from a real source of known location and properties incident on the system, or may be a generated image, such as a standard image such as a cross pattern or determined mathematically, for example using Fourier transforms. Preferably, once the location of the point of incidence of the radiation has been determined, image processing techniques are applied to remove the diffraction spots.