The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2003
Filed:
Nov. 01, 2002
Applicant:
Inventors:
Kiran M. Gupte, Naperville, IL (US);
Kevin Tolley, Boulder, CO (US);
Joel A. Mutchler, Morris, IL (US);
Charles S. Holland, Coal City, IL (US);
Assignee:
Equistar Chemicals, LP, Houston, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 4/44 ;
U.S. Cl.
CPC ...
C08F 4/44 ;
Abstract
A gas-phase process for polymerizing an olefin is disclosed. The process involves feeding the catalyst into the reactor in a stream of gas that comprises at least 75 volume % of a noble gas in order to reduce static.
Gupte, Kiran. (2003). Static reduction (U.S. Patent No. 6630548). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6630548
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile