The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Mar. 14, 2001
Applicant:
Inventors:
Richard Wyatt, Wodbridge, GB;
Robert M. Percival, Ipswich, GB;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/00 ; H04B 1/012 ;
U.S. Cl.
CPC ...
G02B 6/00 ; H04B 1/012 ;
Abstract
A thulium doped silica based glass capable of supporting lasing activity including Tm as a lasing species disposed in a host composition, including oxides of germanium, silicon and tantalum. The preferred concentration of silicon in the host composition being between 15-25 weight percent. The preferred concentration of germanium in the host composition being between 0.1-1 weight percent. The preferred concentration of tantalum in the host composition is greater than 15 weight percent. The preferred concentration of thulium ions being in the range of 500-1000 parts per million by weight.