The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Jun. 21, 2002
John Carl Schotland, Ladue, MO (US);
Vadim Arkadievich Markel, Olivette, MO (US);
Paul Scott Carney, Champaign, IL (US);
Washington University in St. Louis, St. Louis, MO (US);
Abstract
A methodology and concomitant system for three-dimensional near-field microscopy achieves subwavelength resolution of an object without retrieval of the optical phase. The features of this approach are three-fold: (i) the near-field phase problem is circumvented by employing measurements of the power extinguished from probe fields; (ii) the fields on which the power measurements are performed may be monitored far from the object and thus subwavelength resolution is obtained from far zone measurements; and (iii) by developing an analytic approach to the inverse problem in the form of an explicit inversion formula, an image reconstruction algorithm is produced which is strikingly robust in the presence of noise.