The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2003

Filed:

Apr. 25, 2001
Applicant:
Inventors:

Ivan Wu, Taipei, TW;

Dai-Liang Ting, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/133 ;
U.S. Cl.
CPC ...
G02F 1/133 ;
Abstract

The invention provides a method for forming a multi-gap liquid crystal display. The method includes providing a substrate. A first insulating layer is formed on the substrate. Several bus lines are formed on the first insulating layer. A second insulating layer is formed on the first insulating layer and the bus lines. The bus lines divides the substrate into a first color region, a second color region, and a third color region. A photoresist layer covers the second color region and the third color region, where the photoresist layer at the second color region is thinner than that at the third color region. A portion of the first insulating layer and the second insulating layer is etched to expose the substrate at the first color region. A portion of the photoresist layer at the second color region is removed, whereby the second insulating layer is exposed and the remaining photoresist layer still covers the third color region and the bus lines. The second insulating layer is etched to expose the first insulating at the second color region, using the remaining photoresist layer as a mask. Alternatively, the first step of etching can only remove a portion or the whole of the second insulating layer in the first color region, and then the second step of etching removes the first insulating layer to expose the substrate.


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