The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Dec. 16, 1998
Applicant:
Inventor:
Noriyuki Hirayanagi, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/7304 ;
U.S. Cl.
CPC ...
H01J 3/7304 ;
Abstract
A charged-particle-beam exposure apparatus for exposing mask patterns onto a substrate includes a mask illumination system capable of varying the size and/or shape of the beam cross-section (the irradiated or mask-illumination field) at the mask. Initial mask alignment (rough alignment) and calibration are performed by irradiating respective alignment and calibration marks on the mask with a beam having a cross-sectional size smaller than the cross-sectional size of a beam used in the normal exposure process.
Hirayanagi, Noriyuki. (2003). Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods therefor (U.S. Patent No. 6627905). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6627905
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