The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Mar. 10, 2000
Applicant:
Inventors:
Dennis W. Hess, Atlanta, GA (US);
Tazrien Kamal, Atlanta, GA (US);
Assignee:
Georgia Tech Research Corporation, Atlanta, GA (US);
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/43 ; C11D 3/04 ; B08B 7/00 ;
U.S. Cl.
CPC ...
C11D 3/43 ; C11D 3/04 ; B08B 7/00 ;
Abstract
A liquid cleaning composition and method for removal of photoresist including an aliphatic alcohol. Preferably, the alcohol is isopropyl alcohol. Additionally, an alcohol/base mixture can be used to remove photoresist, rather than alcohol used alone. Preferably, the alcohol is isopropyl alcohol, while the aqueous base is ammonium hydroxide. The temperature conditions range from about 25 degrees C. to about 70 degrees C. The pressure conditions range from about 14 pounds per square inch to about 100 pounds per square inch.