The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Oct. 27, 2000
Hyeong Soo Kim, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Abstract
The present invention relates to photoresist compositions for resist flow process and processes for forming a contact hole pattern using the same. In particular, the present invention relates to photoresist composition comprising a thermal curing agent which cures photoresist composition at an elevated temperature. In one embodiment, the thermal curing agent comprises a thermal acid generator and a curing compound. Preferably, the curing compound comprises a cross-linking moiety which is capable of curing the photoresist composition when reacted with the acid that is generated by the thermal acid generator. Photoresist compositions of the present invention reduces or eliminate overflow of photoresist during a resist flow process, thereby preventing a contact hole pattern from being destroyed. In addition, photoresist compositions of the present invention allow formation of uniform sized patterns and increase in etching selection rate.