The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Nov. 10, 2000
Applicant:
Inventor:
Cha Won Koh, Kyoungki-do, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; G03F 7/004 ; G03F 7/38 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/00 ; G03F 7/004 ; G03F 7/38 ; G03F 7/40 ;
Abstract
The present invention provides photoresist compositions for a Top-surface Imaging Process by Silylation (TIPS) and processes for using the same. The photoresist composition comprising a photoresist resin, a photoacid generator, an organic compound, and an amphoteric compound. The amphoteric compound prevents or reduces the amount of acid diffusion into the unexposed area and improves the contrast between the exposed and the unexposed areas. This reduction or prevention of acid diffusion into the unexposed areas reduces line edge roughness (LER).
Koh, Cha. (2003). Photoresist composition for top-surface imaging process by silylation (U.S. Patent No. 6627378). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6627378
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile